한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2010년도 제39회 하계학술대회 초록집
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- Pages.322-322
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- 2010
Preparation and characterization of TiO2 anti-reflective layer for textured Si (100)
- Choe, Jin-U (Department of Chemistry, Sungkyunkwan University) ;
- Nam, Sang-Hun (Department of Chemistry, Sungkyunkwan University) ;
- Jo, Sang-Jin (Department of Chemistry, Sungkyunkwan University) ;
- Bu, Jin-Hyo (Department of Chemistry, Sungkyunkwan University)
- 발행 : 2010.08.18
초록
Recently, anti-reflective films (AR) are one of the most studied parts of a solar cell since these films improve the efficiency of photovoltaic devices. Also, anti-reflection films on the textured silicon solar cells reduce the amount of reflection of the incident light, which improves the device performance due to light trapping of incident light into the cell. Therefore, we preformed two step processes to get textured Si (100) substrate in this experiment. Pyramid size of textured silicon had approximately
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