Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2010.06a
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- Pages.385-385
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- 2010
The Etching Characteristics of $TiO_2$ ThinFilms Using the Inductively Coupled Plasma
유도 결합 플라즈마를 이용한 $TiO_2$ 박막의 식각 특성
- Joo, Young-Hee (Chung-Ang University) ;
- Kim, Chang-Il (Chung-Ang University)
- Published : 2010.06.16
Abstract
In this work, we have investigated the etching characteristics of