한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2010년도 하계학술대회 논문집
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- Pages.382-382
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- 2010
고밀도 플라즈마를 이용한 $HfAlO_3$ 박막의 식각 특성 연구
Dry Etching Characteristics of $HfAlO_3$ Thin Films using Inductively Coupled Plasma
- Ha, Tae-Kyung (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Woo, Jong-Chang (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Kim, Chang-Il (School of Electrical and Electronics Engineering, Chung-Ang University)
- 발행 : 2010.06.16
초록
The etch characteristics of the