Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2010.06a
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- Pages.382-382
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- 2010
Dry Etching Characteristics of $HfAlO_3$ Thin Films using Inductively Coupled Plasma
고밀도 플라즈마를 이용한 $HfAlO_3$ 박막의 식각 특성 연구
- Ha, Tae-Kyung (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Woo, Jong-Chang (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Kim, Chang-Il (School of Electrical and Electronics Engineering, Chung-Ang University)
- Published : 2010.06.16
Abstract
The etch characteristics of the