Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2010.06a
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- Pages.339-339
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- 2010
Photo-assisted GaN wet-chemical Etching using KOH based solution
KOH계열 수용액을 이용한 GaN 박막의 photo-assisted 식각 특성
- Lee, Hyoung-Jin (Electric Power IT Research Center, Korea Electronics Technology Institute (KETI)) ;
- Song, Hong-Ju (Electric Power IT Research Center, Korea Electronics Technology Institute (KETI)) ;
- Choi, Hong-Goo (Electric Power IT Research Center, Korea Electronics Technology Institute (KETI)) ;
- Ha, Min-Woo (Electric Power IT Research Center, Korea Electronics Technology Institute (KETI)) ;
- Roh, Cheong-Hyun (Electric Power IT Research Center, Korea Electronics Technology Institute (KETI)) ;
- Lee, Jun-Ho (Electric Power IT Research Center, Korea Electronics Technology Institute (KETI)) ;
- Park, Jung-Ho (School of Electrical Engineering, Korea University) ;
- Hahn, Cheol-Koo (Electric Power IT Research Center, Korea Electronics Technology Institute (KETI))
- 이형진 (전자부품연구원 전력 IT연구센터) ;
- 송홍주 (전자부품연구원 전력 IT연구센터) ;
- 최홍구 (전자부품연구원 전력 IT연구센터) ;
- 하민우 (전자부품연구원 전력 IT연구센터) ;
- 노정현 (전자부품연구원 전력 IT연구센터) ;
- 이준호 (전자부품연구원 전력 IT연구센터) ;
- 박정호 (고려대학교 전자전기공학부) ;
- 한철구 (전자부품연구원 전력 IT연구센터)
- Published : 2010.06.16
Abstract
Photo-assisted wet chemical etching of GaN thin film was studied using KOH based solutions. A