Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2010.06a
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- Pages.62-62
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- 2010
A study of multiple-exposure nanosphere lithography for photonic quasi-crystals fabrication
광자 준결정 제작을 위한 다중 노광 나노구 리소그라피 연구
- Yeo, Jong-Bin (Chonnam National University) ;
- Lee, Hyun-Yong (Chonnam National University)
- Published : 2010.06.16
Abstract
Photonic quasi-crystals(PQCs) have been fabricated by a multiple-exposure nanosphere lithography (MENSL) method using the self-assembled nanospheres as lens-mask patterns. The multiple-exposing source is collimated laser beam and rotation, tilting system. The arrays of the PQCs exhibited variable lattice structures and shape the control of ratating angle (