Study on the superhydrophilicity of $TiO_2$ films on glasses by thermal CVD

Hydrophilic $TiO_2$ films were deposited on slide glasses using titanium tetraisopropoxide (TTIP) as a precursor by metal-organic chemical vapor deposition (MOCVD). The temperature of substrate was $400^{\circ}C$ and the temperatures of precursor were kept at $75^{\circ}C$ (sample A) and $60^{\circ}C$ (sample B) during the $TiO_2$ film growth. The deposited $TiO_2$ films were characterized by contact angle measurement and uv/vis spectroscopy. The result show that sample B has very low contact angle of almost zero due to superhydrophilic $TiO_2$ surface and transmittance is $76.85%{\pm}1.47%$ at the range of 400 - 700 nm. So, this condition is very optimal for hydrophilic $TiO_2$ film deposition. However, when the temperature of precursor is lower is lower than $50^{\circ}C$ or higher than $75^{\circ}C$, $TiO_2$ could not be deposited on the substrate and cloudy $TiO_2$ film was formed due to low precursor temperature and the increase of surface roughness, respectively.