The study of post annealing effects on low dielectric constant SiOC films

  • Park, S.H. (Institute of Physics and Applied Physics, Yonsei University) ;
  • Kim, H.J. (Institute of Physics and Applied Physics, Yonsei University) ;
  • Cho, M.H. (Institute of Physics and Applied Physics, Yonsei University) ;
  • Hahn, J.H. (Division of Industrial Metrology, KRISS) ;
  • Lee, D.H. (R & D Center, ATTO. CO. LTD.) ;
  • Kwon, Y.S. (R & D Center, ATTO. CO. LTD.) ;
  • Park, S.Y. (R & D Center, ATTO. CO. LTD.) ;
  • Kim, M.S. (Air Products and Chemicals, Inc)
  • 발행 : 2009.08.19