Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2009.08a
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- Pages.223-223
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- 2009
The study of post annealing effects on low dielectric constant SiOC films
- Park, S.H. (Institute of Physics and Applied Physics, Yonsei University) ;
- Kim, H.J. (Institute of Physics and Applied Physics, Yonsei University) ;
- Cho, M.H. (Institute of Physics and Applied Physics, Yonsei University) ;
- Hahn, J.H. (Division of Industrial Metrology, KRISS) ;
- Lee, D.H. (R & D Center, ATTO. CO. LTD.) ;
- Kwon, Y.S. (R & D Center, ATTO. CO. LTD.) ;
- Park, S.Y. (R & D Center, ATTO. CO. LTD.) ;
- Kim, M.S. (Air Products and Chemicals, Inc)
- Published : 2009.08.19
Abstract
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