한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2009년도 제37회 하계학술대회 초록집
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- Pages.219-219
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- 2009
Interfaces properties of low dielectric constant SiOC(-H) films deposited by plasma enhanced chemical vapor deposition
- Kim, Chang-Young (Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
- Lee, Heang-Seuk (Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
- Woo, Jong-Kwan (Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
- Choi, Chi-Kyu (Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University)
- 발행 : 2009.08.19