Analysis of Selective Emitter Properties Apply for Low Cost Metallization in Crystalline Silicon Solar Cells

결정질 실리콘 태양전지의 저가형 금속전극에 적용되기 위한 Selective emitter 특성 분석

  • Kim, Min-Jeong (Strategic Energy Research Institute, Sejong University) ;
  • Lee, Ji-Hun (Strategic Energy Research Institute, Sejong University) ;
  • Cho, Kyeong-Yeon (Strategic Energy Research Institute, Sejong University) ;
  • Lee, Soo-Hong (Strategic Energy Research Institute, Sejong University)
  • 김민정 (세종대학교 전략에너지연구소) ;
  • 이지훈 (세종대학교 전략에너지연구소) ;
  • 조경연 (세종대학교 전략에너지연구소) ;
  • 이수홍 (세종대학교 전략에너지연구소)
  • Published : 2009.06.18

Abstract

Selective emitter structure have an important research subject for crystalline silicon solar cells because it is used in production for high efficiency solar cells. A selective emitter structure with highly doped regions underneath the metal contacts is widely known to be one of the most promising high-efficiency solution in solar cell processing. Since most of the selective emitter processes require expensive extra masking and double steps process. Formation of selective emitters is not cost effective. One method that satisfies these requirements is the method of screen-printing with a phosphorus doping paste. In this paper we researched two groups of selective emitter structure process. One was using dopant paste, and the other was using solid source, in order to compare their uniformity, sheet resistance and performance condition time.

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