한국정보디스플레이학회:학술대회논문집
- 2009.10a
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- Pages.1504-1507
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- 2009
Dry etching of ZnO thin film using a $CF_4$ mixed by Ar
- Kim, Do-Young (Dept. of Materials Science and Engineering, POSTECH) ;
- Kim, Hyung-Jun (Dept. of Materials Science and Engineering, POSTECH)
- Published : 2009.10.12
Abstract
In this paper, the etching behavior of ZnO in