한국정보디스플레이학회:학술대회논문집
- 2009.10a
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- Pages.1500-1503
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- 2009
Atmospheric Pressure Plasma Ashing of Photoresist Using Pin to Plate Dielectric Barrier Discharge
- Park, Jae-Beom (SKKU Advanced Institute of Nano Technology(SAINT), Sungkyunkwan Univ.) ;
- Oh, Jong-Sik (Dept. of Advanced Materials Engineering, Sungkyunkwan Univ.) ;
- Yeom, Geun-Young (SKKU Advanced Institute of Nano Technology(SAINT), Sungkyunkwan Univ.)
- Published : 2009.10.12
Abstract
In this paper, we studied about atmospheric pressure remote plasma ashing of photoresist(PR), by using a modified dielectric barrier discharge(DBD). The effect of various gas combinations such as