Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2009.07a
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- Pages.1244_1245
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- 2009
Coating of amorphous nitrides on carbon nanotubes and field emission properties
탄소 나노튜브에 대한 비정질 질화막의 코팅 및 전계방출 특성
- Noh, Young-Rok (Dept. of Electronic, Electrical, Control and Instrumentation Engineering, Hanyang University) ;
- Kim, Jong-Pil (Dept. of Electronic, Electrical, Control and Instrumentation Engineering, Hanyang University) ;
- Park, Jin-Seok (Dept. of Electronic, Electrical, Control and Instrumentation Engineering, Hanyang University)
- Published : 2009.07.14
Abstract
Coating of amorphous nitride thin layers, such as boron nitride (BN) and carbon nitride (CN), has been performed on carbon nanotubes (CNTs) for the purpose of enhancing their electron-emission performances because those nitride films have relatively low work functions and commonly exhibit negative electron affinity behavior. The CNTs were directly grown on metal-tip (tungsten, approximately 500 nm in diameter at the summit part) substrates by inductively coupled plasma-chemical vapor deposition (ICP-CVD). Sharpening of the tungsten tips were carried out by electrochemical etching. Morphologies and microstructures of BN and CN films were analyzed by field-emission scanning electron microscopy (FE-SEM), energy dispersive x-ray (EDX) spectroscopy, and Raman spectroscopy. The electron-emission properties (such as maximum emission currents and turn-on fields) of the BN-coated and CN-coated CNT-emitters were characterized in terms of the thickness of BN and CN layers.
Keywords