Proceedings of the IEEK Conference (대한전자공학회:학술대회논문집)
- 2008.06a
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- Pages.933-934
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- 2008
Self-Inspection for Photomask Defect Extraction
자체 검사를 이용한 포토마스크 결점 추출
- Choi, Ji-Hee (Department of EEE POSTECH) ;
- Jeong, Hong (Department of EEE POSTECH)
- Published : 2008.06.18
Abstract
This paper describes the process of extracting defect from optical photomask images. We introduce a new method of finding photomask detects with a single optical photomask damaged image. The proposed algorithm is efficient when an original undamaged image is unavailable. The experiment showed that even a small and discontinuous photomask defect was extracted as well as continuous type of defects.
Keywords