Etching characteristics of ArF and EUV resists in dual-frequency superimposed capacitively coupled $CF_4/O_2$/Ar and $CF_4/CHF_3/O_2$/Ar plasmas

• Gwon, Bong-Su (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
• Park, Yeong-Rok (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
• Kim, Jin-Seong (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
• An, Jeong-Ho (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
• Lee, Nae-Eung (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
• Lee, Seong-Gwon (Research & Development Division, Hynix Semiconductor) ;
• Park, Seong-Uk (Research & Development Division, Hynix Semiconductor)

• 권봉수 ;
• 박영록 ;
• 김진성 ;
• 안정호 ;
• 이내응 ;
• 이성권 ;
• 박성욱

• Published : 2008.08.20

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