한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2008년도 제35회 하계학술대회 초록집
- /
- Pages.157-157
- /
- 2008
Silicidation Properties of Atomic Layer Deposited Nickel Film using by Rapid Thermal Process
- Kim, Chang-Young (Department of Physics, Cheju National University) ;
- Yun, Sang-Won (School of Electrical Engineering and Computer Science, Kyungpook National University) ;
- Lee, Jung-Hee (School of Electrical Engineering and Computer Science, Kyungpook National University) ;
- Choi, Chi-Kyu (Department of Physics, Cheju National University) ;
- Lee, Kwang-Man (Faculty of Electrical and Electronic Engineering, Cheju National University)
- 발행 : 2008.08.20