Selective etching of Mo/$HfO_2$ in inductively coupled $Cl_2/O_2$ plasmas for gate stack patterning

Jung, H.Y. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kwon, B.S. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Lee, H.J. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kim, S.I. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Kim, H.W. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
Lee, N.E. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University)