Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2008.11a
- /
- Pages.102-102
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- 2008
Etching properties of sapphire substrate using $CH_4$ /Ar inductively coupled plasma
$CH_4$ /Ar 유도 결합 플라즈마를 이용한 Sapphire 기판의 식각 특성
- Um, Doo-Seung (Chung-Ang Univ.) ;
- Kim, Gwan-Ha (Chung-Ang Univ.) ;
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Kim, Dong-Pyo
(Chung-Ang Univ.) ;
- Yang, Xue (Chung-Ang Univ.) ;
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Kim, Chang-Il
(Chung-Ang Univ.)
- Published : 2008.11.06
Abstract
Sapphire (