한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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- Pages.13-14
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- 2008
Remote Plasma ALD법으로 제작한 $Al_2O_3$ /GaN MIS 커패시터의 전기적 특성
Electrical properties of $Al_2O_3$ /GaN MIS capacitor deposited by Remote Plasma ALD
- Kwak, No-Won (Cheongju University) ;
- Yun, Hyeong-Sun (Cheongju University) ;
- Lee, Woo-Seok (Cheongju University) ;
- Kim, Ka-Lam (Cheongju University) ;
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Kim, Kwang-Ho
(Cheongju University)
- 발행 : 2008.11.06
초록