한국정보디스플레이학회:학술대회논문집
- 2008.10a
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- Pages.1269-1271
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- 2008
Research of the TFT-LCD Photosensitive Resist Thickness
- Zhang, Mi (BOE Technology Group CO., LTD) ;
- Xue, Jian She (BOE Technology Group CO., LTD) ;
- Wang, Wei (BOE Technology Group CO., LTD) ;
- Park, Chun-Bae (BOE Technology Group CO., LTD) ;
- Koh, Jai-Wan (BOE Technology Group CO., LTD) ;
- Zhang, Zhi-Min (Institute of Computing Technology of the Chinese Academy of Sciences)
- Published : 2008.10.13
Abstract
We find some array mura are caused by S/D bridge or channel open in 4 mask process. The gray tone PR thickness non-uniformity is the main reason of these defects. By the adjustment of exposure and dry etch parameters, S/D bridge and channel open ratio drops by 10.87%.