한국정보디스플레이학회:학술대회논문집
- 2008.10a
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- Pages.82-85
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- 2008
5-3: [Invited] Roll-to-Roll Manufacturing of Electronics on Flexible Substrates Using Self-Aligned Imprint Lithography (SAIL)
- Kim, Han-Jun (Hewlett Packard Labs) ;
- Almanza-Workman, Marcia (Hewlett Packard Labs) ;
- Chaiken, Alison (Hewlett Packard Labs) ;
- Elder, Richard (Hewlett Packard Labs) ;
- Garcia, Bob (Hewlett Packard Labs) ;
- Jackson, Warren (Hewlett Packard Labs) ;
- Jeans, Albert (Hewlett Packard Labs) ;
- Kwon, Oh-Seung (Hewlett Packard Labs) ;
- Luo, Hao (Hewlett Packard Labs) ;
- Mei, Ping (Hewlett Packard Labs) ;
- Perlov, Craig (Hewlett Packard Labs) ;
- Taussig, Carl (Hewlett Packard Labs) ;
- Jeffrey, Frank (PowerFilm Inc.) ;
- Beacom, Kelly (PowerFilm Inc.) ;
- Braymen, Steve (PowerFilm Inc.) ;
- Hauschildt, Jason (PowerFilm Inc.) ;
- Larson, Don (PowerFilm Inc.)
- Published : 2008.10.13
Abstract
We are working towards large-area arrays of thin film transistors on polymer substrates using roll-to-roll (R2R) processes exclusively. Self-aligned imprint lithography (SAIL) is an enabler to pattern and align submicron features on meter-scaled flexible substrates in the R2R environment. The progress, current status and remaining issues of this new fabrication technology are presented.