Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2008.10a
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- Pages.131-132
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- 2008
Fabrication of embedded bottom electrodes for submicron beam resonators
서브마이크론 빔 레조네이터 제작을 위한 바닥전극 형성방법
- Lee, Yong-Seok (Seoul National University) ;
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Jang, Yun-Ho
(Seoul National University) ;
- Bang, Yong-Seung (Seoul National University) ;
- Kim, Jung-Mu (Chonbuk National University) ;
- Kim, Jong-Man (Pusan National University) ;
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Kim, Yong-Kweon
(Seoul National University)
- Published : 2008.10.31
Abstract
We describe a fabrication method of submicron glass trenches which have embedded metal lines for the future application of nano-scale RF MEMS devices. The glass wafer was etched using two different conditions to identify the relationship between the slope of glass trenches and the slope of photroresist. A self-aligned metal photomask and negative photroresist (PR) slope were used to insert metal lines inside the glass trenches. The PR slope patterned by backside photolithography was affected by the profile of preformed glass trenches. Gold was well fabricated in the
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