Optimization for Fused Quartz DRIE using Taguchi Method

다구치 방법을 이용한 비정질 수정 건식 식각 최적화

In this paper, optimal DRIE process conditions for fused quartz are experimentally determined by Taguchi method to develop high-performance inertial sensors based on the fused quartz material, which is known to have high Q-factors. Using Si layer as an etch mask, which was formed by previously developed bonding process of the fused quartz and Si wafer, fused quartz DRIE process was performed. Different 9 flow rate conditions of $C_4F_8$, $O_2$, He gas have been tested and the optimum combination of these factors was estimated. By this work, the ability to fabricate high aspect ratio fused quartz structure was confirmed.