Effect of pressure on the chemical composition and structure of carbon nitride film deposited by RF magnetron sputtering

  • Roh, Ki-Min (Korea Advanced Institute of Science and Engineering) ;
  • Na, Byung-Keun (Korea Advanced Institute of Science and Engineering) ;
  • Choi, Si-Kyoung (Korea Advanced Institute of Science and Engineering) ;
  • Kim, Jung-Hyung (Korea Research Institute of Standards and Science)
  • Published : 2007.08.15