Proceedings of the Korean Society Of Semiconductor Equipment Technology (한국반도체및디스플레이장비학회:학술대회논문집)
- 2007.06a
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- Pages.252-252
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- 2007
Application of Rapid Thermal Annealing To Activation in Low Temperature Polycrystalline Si Thin Films
- Lee, Jong-Won (Dept. of Mat. Sci. & Eng. Hongik University) ;
- So, Byung-Soo (Dept. of Mat. Sci. & Eng. Hongik University) ;
-
Bae, Seung-Muk
(Dept. of Mat. Sci. & Eng. Hongik University)
;
- Lee, Yohg-Ho (Korea Institute of Ceramic Eng. & Tech.) ;
- Seo, Won-Seon (Korea Institute of Ceramic Eng. & Tech.) ;
- Kim, Woung-Hwan (Dept. of Mat. Sci. & Eng. Hongik University) ;
- Hwang, Jin-Ha (Dept. of Mat. Sci. & Eng. Hongik University) ;
- Kim, Yeong-Cheol (Dept. of Material Eng. Korea University of Technology & Education)
- Published : 2007.06.08