한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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- Pages.140-141
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- 2007
Preparation of the SBT Film on the LZO/Si Structure for FRAM Application
- Im, Jong-Hyun (University of Seoul) ;
- Jeon, Ho-Seung (University of Seoul) ;
- Kim, Joo-Nam (University of Seoul) ;
- Park, Byung-Eun (University of Seoul) ;
- Kim, Chul-Ju (University of Seoul)
- 발행 : 2007.06.21
초록
To fabricate the metal-ferroelectric-insulator-semiconductor (MFIS) structure for the ferroelectric random access memory (FRAM) application, we prepared the ferroelectric