한국정보디스플레이학회:학술대회논문집
- 2007.08b
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- Pages.1715-1718
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- 2007
Development of High Performance Indium Tin Oxide Films at Room Temperature by Plasma-Damage Free Neutral Beam Sputtering System
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Jang, Jin-Nyoung
(Dept. of Display and Semiconductor Physics, Korea University)
;
- Oh, Kyoung-Suk (National Fusion Research Center) ;
- Yoo, Suk-Jae (National Fusion Research Center) ;
- Kim, Dae-Chul (National Fusion Research Center) ;
- Lee, Bon-Ju (National Fusion Research Center) ;
- Yang, Ie-Hong (Dept. of Display and Semiconductor Physics, Korea University) ;
- Moon, Ji-Sun (Dept. of Display and Semiconductor Physics, Korea University) ;
- Kim, Jong-Sik (SEM Technology) ;
- Choi, Soung-Woong (Dept. of Information Technology, Handong Global University) ;
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Park, Young-Chun
(Dept. of Information Technology, Handong Global University)
;
-
Hong, Mun-Pyo
(Dept. of Display and Semiconductor Physics, Korea University)
- Published : 2007.08.27
Abstract
New ITO thin film of good performance has been developed by brand-new, plasma-damage-free sputtering process at the room temperature. The room temperature-processed ITO films with optimized conditions as neutral beam acceleration bias of -30V and In & Sn composition ratio of 99:01 gives lower resistivity as