대한기계학회:학술대회논문집 (Proceedings of the KSME Conference)
- 대한기계학회 2007년도 춘계학술대회A
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- Pages.532-537
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- 2007
연속체 가정을 통한 NIL 공정의 전산모사
Numerical Simulation of NIL Process Based on Continuum Hypothesis
초록
Nano imprint lithography(NIL) is a cost-efficient, high-throughput processing technique to transfer nano-scale patterns onto thin polymer films. Polymers used as the resist include UV cured resins as well as thermoplastics such as polymethyl-methacrylate(PMMA). In this study, an analytic investigation was performed for the NIL process of transferring nano scale patterns onto polymeric films. Process optimization calls for a thorough understanding of resist flow during the process. We carried out 2D and 3D numerical analyses of resist flow during NIL process. The simulation incorporated continuum-hypothesis and the effects of surface tension were taken into account. For a more effective prediction of free surface, fixed grid scheme with the volume of fluid (VOF) method were used. The simulation results were verified with experimental results qualitatively. And the parametric study was performed for various process conditions.