IZO/Glass 성막 시 SiO가스배리어막의 영향

The Effects of SiO Gas Barrier Film on the Depositing IZO/Glass Thin Film

  • 김도형 (동의대학교 대학원 기계공학과) ;
  • 윤한기 (동의대학교 대학원 기계공학과) ;
  • ;
  • 발행 : 2007.05.30

초록

In this work, the indium zinc oxide (IZO) films had been deposited on the glass substrate coated with the SiO film. Based on a comparative investigation of the IZO monolayer and IZO/SiO multilayer, it is shown that the thickness of SiO film has a great effect on the mechanical properties of the thin films. The AFM images of the IZO thin film included the SiO film were shown smoother surfaces than monolayer. Resistivity was in inverse proportion to Mobility. If it deposited the SiO film on the substrate, the layer of change was generated between two layer(SiO and substrate). The layer of change influenced resistance because of oxygen content was more than the IZO monolayer.

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