Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2007.02a
- /
- Pages.88-88
- /
- 2007
Etching characteristics of DLC-hard mask using dual frequency superimposed capacitively coupled plasmas (DFS-CCP)
- Kim, H.T. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Kwon, B.S. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Lee, N.E. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Cho, H.J. (School of Information and Communication Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Hong, B.Y. (School of Information and Communication Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University)
- Published : 2007.02.06
Abstract
Keywords