블록공중합체 패턴 형성시 전계에 의한 영향

Effect of Electrical Field on Blockcopolymer Patterning

Polystyrene-block-polymethyl methacrylate (PS-b-PMMA) can pattern nanoscale structures over large areas. However these patterns have a short-range order. These short-range order limits their utility in some applications. Consequently, we have to overcome this limitation of block-copolymer. In this study we added a electrical field to the standard block-copolymer patterning method for long-range ordered arrays of nanostructures. This method is conformed by annealing a block copolymer with applied voltages. It is very simple method that do not have any additional hour. In this reason it can be applied easily for other nanostructure fabrications. This method opens up a new route to the controlled phase separation of block copolymers with precise place of the nanostructures.