Proceedings of the IEEK Conference (대한전자공학회:학술대회논문집)
- 2006.06a
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- Pages.549-550
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- 2006
Novel fabricated multi layer pattering using novolak and epoxy resin polymer.
Novolak 계열과 Epoxy 계열의 고분자를 이용한 새로운 multi layer 패턴 형성 방법
- Kim, Han-Hyoung (Micro-Photonics Advanced Research Center, School of Information and Communication Engineering Inha University) ;
- Yang, Seung-Kook (Micro-Photonics Advanced Research Center, School of Information and Communication Engineering Inha University) ;
- Yoo, Han-Suk (Micro-Photonics Advanced Research Center, School of Information and Communication Engineering Inha University) ;
- Lee, Seung-Yong (Micro-Photonics Advanced Research Center, School of Information and Communication Engineering Inha University) ;
- O, Beom-Hoan (Micro-Photonics Advanced Research Center, School of Information and Communication Engineering Inha University) ;
- Lee, Seung-Gol (Micro-Photonics Advanced Research Center, School of Information and Communication Engineering Inha University) ;
- Lee, El-Hang (Micro-Photonics Advanced Research Center, School of Information and Communication Engineering Inha University) ;
- Park, Se-Geun (Micro-Photonics Advanced Research Center, School of Information and Communication Engineering Inha University)
- 김한형 (인하대학교 정보통신공학과 집적형광자기술연구센터) ;
- 양승국 (인하대학교 정보통신공학과 집적형광자기술연구센터) ;
- 유한석 (인하대학교 정보통신공학과 집적형광자기술연구센터) ;
- 이승용 (인하대학교 정보통신공학과 집적형광자기술연구센터) ;
- 오범환 (인하대학교 정보통신공학과 집적형광자기술연구센터) ;
- 이승걸 (인하대학교 정보통신공학과 집적형광자기술연구센터) ;
- 이일항 (인하대학교 정보통신공학과 집적형광자기술연구센터) ;
- 박세근 (인하대학교 정보통신공학과 집적형광자기술연구센터)
- Published : 2006.06.21
Abstract
It has become topic continuously at MEMS or semiconductor process to form three-dimensional multilayer structure. In this paper, we devised the new polymer pattern method that has multilayer structure. This is method that uses different kind of polymeric material. Specially, polymers used in this study that we propose became all pattern by photolithography, prevented that process increases. Here, polymer that we use used polymer of epoxy order called "SU-8" and polymer of novolak resin called "AZ-1518". The result, "SU-8" was formed pattern to 3.5um thickness, and "AZ-1518" about pattern 3um thickness. Also, It was been 6um thickness at same pattern area.
Keywords