Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)
- 2006.05a
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- Pages.145-146
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- 2006
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- 2005-8446(pISSN)
Fabrication of Fluorine Doped Diamond-Like Carbon Stamp for UV-Nanoimprint Lithography
UV 나노임프린트 리소그래피를 위한 불화 함유 다이아몬드 상 탄소 스탬프의 제작
- Ozhan Altun Ali (Nano-Mechanical Systems Research Center, KIMM) ;
- Jeong Jun-Ho (Nano-Mechanical Systems Research Center, KIMM) ;
- Rha Jong-Joo (Surface Engineering Dept., KIMM) ;
- Choi Dae-Geun (Nano-Mechanical Systems Research Center, KIMM) ;
- Kim Ki-Don (Nano-Mechanical Systems Research Center, KIMM) ;
- Lee Eung-Sug (Nano-Mechanical Systems Research Center, KIMM)
- 알툰 알리 (한국기계연구원 나노공정장비연구센터) ;
- 정준호 (한국기계연구원 나노공정장비연구센터) ;
- 나종주 (한국기계연구원 표면연구부) ;
- 최대근 (한국기계연구원 나노공정장비연구센터) ;
- 김기돈 (한국기계연구원 나노공정장비연구센터) ;
- 이응숙 (한국기계연구원 나노공정장비연구센터)
- Published : 2006.05.01
Abstract
A fluorine-doped diamond-like carbon (F-DLC) stamp which has high contact angle, high UV-transmittance and sufficient hardness, was fabricated using the following direct etching method: F-DLC is deposited on a quartz substrate using DC and RF magnetron sputtering, PMMA is spin coated and patterned using e-beam lithography and finally, O2 plasma etching is performed to transfer the line patterns having 100 nm line width, 100 nm line space and 70 nm line depth on F-DLC. The optimum fluorine concentration was determined after performing several pre-experiments. The stamp was applied successfully to UV-NIL without being coated with an anti-adhesion layer.
Keywords