한국정보디스플레이학회:학술대회논문집

The Korean Infomation Display Society (한국정보디스플레이학회)
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Uniformity Optimization of TFTs Fabricated on 2-shot SLS-Processed Si Films

  • Turk, Brandon A. (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University) ;
  • Wilt, P.C. Van Der (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University) ;
  • Crowder, M.A. (Sharp Laboratories of America) ;
  • Voutsas, A.T. (Sharp Laboratories of America) ;
  • Limanov, A.B. (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University) ;
  • Chung, U.J. (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University) ;
  • Im, James S. (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University)
  • Published : 2006.08.22
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Abstract

Nonoptimal placement of short-channel-length TFTs in large-grained polycrystalline Si films with a periodic microstructure, as for instance obtained via 2-shot SLS, can potentially lead to degradation in the overall uniformity of the resultant devices. In this paper, we explain and demonstrate that by simply introducing a well-defined misorientation between the devices and the periodic microstructure, it is possible to significantly reduce (and potentially entirely eliminate) the device nonuniformity problem that can arise from such a cause.

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