Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2006.10a
- /
- Pages.95-96
- /
- 2006
Surface Properties of ITO Thin Film by Planarization
광역평탄화에 따른 투명전도박막의 표면특성
-
Choi, Gwon-Woo
(Chosun University) ;
- Lee, Woo-Sun (Chosun University) ;
- Seo, Yong-Jin (Daebul University)
- Published : 2006.10.27
Abstract
ITO thin film is generally fabricated by various methods such as spray, CVD, evaporation, electron gun deposition, direct current electroplating, high frequency sputtering, and reactive DC sputtering. However, some problems such as peaks, bumps, large particles, and pin-holes on the surface of ITO thin film were reported, which caused the destruction of color quality, the reduction of device life time, and short-circuit. Chemical mechanical polishing (CMP) process is one of the suitable solutions which could solve the problems.
Keywords