$MnO_2$ 연마제를 혼합한 Mixed Abraive Slurry (MAS)의 CMP 특성

A Study on the Oxide CMP Characteristics of using $MnO_2$-Mixed Abrasive Slurry ($MnO_2$-MAS)

Chemical mechanical polishing (CMP) process has been attracted as an essential technology of multi-level interconnection. However, the COO (cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper, $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. Also, the addition effects of $MnO_2$ abrasives and the diluted silica slurry (DSS) on CMP performances were evaluated. Finally, we have investigated the possibility of new abrasive for the oxide CMP application.