Fabrication of Ultra Low Temperature Poly crystalline Silicon Thin-Film Transistors on a Plastic Substrate

고분자 기판 상에 제작된 극저온 다결정 실리콘 박막 트랜지스터에 관한 연구

  • Kim, Yong-Hoon (Information Display Research Center, Korea Electronics Technology Institute) ;
  • Kim, Won-Keun (Information Display Research Center, Korea Electronics Technology Institute) ;
  • Moon, Dae-Gyu (Information Display Research Center, Korea Electronics Technology Institute) ;
  • Han, Jeong-In (Information Display Research Center, Korea Electronics Technology Institute)
  • 김영훈 (전자부품연구원 디스플레이연구센터) ;
  • 김원근 (전자부품연구원 디스플레이연구센터) ;
  • 문대규 (전자부품연구원 디스플레이연구센터) ;
  • 한정인 (전자부품연구원 디스플레이연구센터)
  • Published : 2005.07.07

Abstract

This letter reports the fabrication of polycrystalline silicon thin-film transistors (poly-Si TFT) on flexible plastic substrates using amorphous silicon (a-Si) precursor films by sputter deposition. The a-Si films were deposited with mixture gas of argon and helium to minimize the argon incorporation into the film. The precursor films were then laser crystallized using XeCl excimer laser irradiation and a four-mask-processed poly-Si TFTs were fabricated with fully self-aligned top gate structure.

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