한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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- Pages.407-408
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- 2005
알루미늄 전해 커패시터용 음극박의 에칭 피트 성장
Etch Pit Growth on Aluminum of Cathode Film for Aluminum Electrolytic Capacitor
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Kim, Hong-Il
(Chungbuk National University) ;
- Choi, Ho-Gil (Chungbuk National University) ;
- Kim, Sung-Han (R&D Lab., Korea JCC Co., Ltd.) ;
- Kim, Young-Sam (R&D Lab., Korea JCC Co., Ltd.) ;
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Shin, Jin-Sik
(R&D Lab., Korea JCC Co., Ltd.) ;
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Park, Soo-Gil
(Chungbuk National University)
- 발행 : 2005.07.07
초록
High surface area electrodes for aluminum electrolytic capacitors are produced by AC electrochemical processes. Optimization of crystallographic etch pit growth on aluminium during AC etching of cathode film for aluminium as electrolytic capacitor has been established. In this work, we present the observations of pit distributions by galvanostatic measurements. The effects of electrolyte concentration, current density, frequency, various pre-treatments and etching time have been studied. The specimen was pretreated in 0.5M NaOH and 1M HCl at