지능 알고리즘을 이용한 스마트 약액 공급 장치

  • 홍광진 (한국기술교육대학교 정보기술공학부) ;
  • 김종원 (한국기술교육대학교 정보기술공학부) ;
  • 조현찬 (한국기술교육대학교 정보기술공학부) ;
  • 김광선 (한국기술교육대학교 메카트로닉스공학부) ;
  • 김두용 (순천향대학교 정보기술공학부) ;
  • 조중근 ((주) 세메스)
  • Published : 2005.05.01

Abstract

The wafer's size has been increased up to 300mm according as the devices have been integrated sophisticatedly. For this process to make 300mm-wafer, it is required strict level which removes the particulates on the surface of wafer. Therefore we need new type wet-station which can reduce DI water and chemical in the cleaning process. Moreover, it is very important to control the temperature and the concentration of chemical wet-stat ion. The chemical supply system which is used currently is not only difficult to make a fit mixing rate of chemical in cleaning process, but also it is difficult to make fit quantity and temperature. We propose new chemical supply system, which overcomes the problems via analysis of fluid and thermal transfer on chemical supply system,

Keywords