Proceedings of the Korean Society Of Semiconductor Equipment Technology (한국반도체및디스플레이장비학회:학술대회논문집)
- 2005.05a
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- Pages.67-72
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- 2005
Electrical Properties of Organic Materials as Low Dielectric Constant Materials
- Oh Teresa (School of Nano and Advanced Materials Engineering, Changwon National University) ;
- Kim Hong Bae (School of Electronic and Information Engineering, Cheongju University) ;
- Kwon Hak Yong (School of Electronic and Information Engineering, Cheongju University) ;
- Son Jae Gu (School of Electronic and Information Engineering, Cheongju University)
- Published : 2005.05.01
Abstract
The bonding structure of organic materials such as fluorinated amorphous carbon films was classified into two types due to the chemical shifts. The electrical properties of fluorinated amorphous carbon films also showed very different effect of two types notwithstanding a very little difference. Fluorinated amorphous carbon films with the cross-link breakage structure existed large leakage current resulting from effect of the electron tunneling. Increasing the cation due to the electron-deficient group increased the barrier height of the films with the cross-link amorphous structure, therefore the electric characteristic of the final materials with low dielectric constant was also improved. The lowest dielectric constant is 2.3 at the sample with the cross-link amorphous structure.
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