Investigation of thermal stability of strained Si on relaxed SiGe layer

  • Jang, C.H. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
  • Lee, J.W. (Dept. of Advanced MaterialsEngineering, Sungkyunkwan University) ;
  • Yang, C.W. (Dept. of Advanced MaterialsEngineering, Sungkyunkwan University) ;
  • Sardela Jr., M. R. (The Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign) ;
  • Song, Y.J. (Semiconductor Division, Electronics and Telecommunications Research Institute) ;
  • Shim, K.H. (Semiconductor Division, Electronics and Telecommunications Research Institute) ;
  • Lee, N.E. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University)
  • 발행 : 2004.08.19