한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2004년도 제6회 학술대회 논문집 일렉트렛트 및 응용기술연구회
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- Pages.35-38
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- 2004
초전도 박막 제작을 위한 산화 오존의 평가
Evaluation of Oxidation Ozone for Superconductor Thin Film Growth
- Lim, Jung-Kwan (Dongshin Uni.) ;
- Park, Yong-Pil (Dongshin Uni.) ;
- Lee, Hee-Kab (KCCI)
- 발행 : 2004.04.30
초록
Ozone is useful oxidizing gas for the fabrication of oxide thin films. Accordingly researching on oxidizing gas is required. In order to obtain high quality oxide thin films, higher ozone concentration is necessary. In this paper oxidation property was evaluated relation between oxide gas pressure and inverse temperature(CuO reaction). The obtained condition was formulated by the fabrication of Cu metal thin film by co-deposition using the Ion Beam Sputtering method. Because the CuO phase peak appeared at the XRD evaluation of the CuO thin film using ozone gas, this study has succeeded in the fabrication of the CuO phase at