한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2004년도 춘계학술대회 논문집 반도체 재료 센서 박막재료 전자세라믹스
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- Pages.30-33
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- 2004
박막 $p^+-n$ 접합 형성을 위한 보론 확산 시뮬레이터의 제작에 관한 연구
A study on the design of boron diffusion simulator applicable for shallow $p^+-n$ junction formation
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Kim, Jae-Young
(HANKUK AVIATION UNIVERSITY, School of Electronics, Telecommunication and Computer Engineering) ;
- Kim, Bo-Ra (HANKUK AVIATION UNIVERSITY, School of Electronics, Telecommunication and Computer Engineering) ;
- Hong, Shin-Nam (HANKUK AVIATION UNIVERSITY, School of Electronics, Telecommunication and Computer Engineering)
- 발행 : 2004.04.24
초록
Shallow p+-n junctions were formed by low-energy ion implantation and dual-step annealing processes The dopant implantation was performed into the crystalline substrates using