Development Characteristics of PMMA fabricated by X-ray Lithography in Various Development Conditions

X-ray 식각된 PMMA의 다양한 현상조건에 따른 현상특성

Micro-structures fabricated by X-ray lithography are largely affected by doses, development conditions and other factors. For these reasons, PMMA development rates and its surface profiles under various development conditions were obseued. Development rates were measured in the rage from 1 to 6 $kJ/cm^3$ using the 9C1 white beamline of Pohang light source(PLS). In this experiment, we observed that development rates of stacked PMMA sheet using Si filter were relatively higher than that of not using Si filter. Furthermore, development rates in condition with the acoustic agitation(1 MHz, 3.67 $W/cm^3$) were twice than that in dipping condition with $35^{\circ}C$ developer considering the PMMA sheets-substrate bond strength