한국정밀공학회:학술대회논문집 (Proceedings of the Korean Society of Precision Engineering Conference)
- 한국정밀공학회 2004년도 추계학술대회 논문집
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- Pages.92-96
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- 2004
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- 2005-8446(pISSN)
실험계획법에 의한 파라미터 분석과 Run to Run 제어를 이용한 폴리싱 공정 제어
Run-to-Run Process Control and the Analysis of Process Parameters using Design of Experiment in Surface Finishing
초록
In this paper, polishing method using bonded magnetic abrasive particle has been applied to the micro mold polishing. Through process control using the Run-to-Run control, it tried to form the surface roughness In order to grasp the influence of the surface roughness which is reached by selection of control factor and the factor, a design of experiment was been processed. The study is processed with a purpose of to embody and to maintain the surface roughness of nano scale by the basis of an influence between a control factor and the factors which has been selected in this way. As a result, the result of the process control converged at a target value of surface roughness Ra 10nm and Rmax 50nm
키워드