Investigation of HfO$_{2}-Al_{2}O_{3}$ laminate and Hf-Al-O films with poly-Si Gates.

  • Hua, J. (Department of Physics, Chungbuk National University) ;
  • Lee, S.W. (Department of Physics, Chungbuk National University) ;
  • Kang, H.J. (Department of Physics, Chungbuk National University) ;
  • Lee, Y.S. (Div. of Information Communication & Computer Eng.) ;
  • Lim, K.Y. (Hynix Semiconductor Inc.) ;
  • Cho, H.J. (Hynix Semiconductor Inc.) ;
  • Lee, N.K. (Genus Korea Co. Ltd.)
  • Published : 2003.02.14