Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2003.02a
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- Pages.102-102
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- 2003
Chemically Amplified Photoresists for Electron Beam Lithography
- Choi, Young-Min (Department of Chemistry, Hanyang University) ;
- Park, Sang-Wook (Department of Chemistry, Hanyang University) ;
- Kim, Yong-Il (Department of Chemistry, Hanyang University) ;
- Jegal, Jin (Department of Chemistry, Hanyang University) ;
- Lee, Hai-Won (Department of Chemistry, Hanyang University)
- Published : 2003.02.14
Abstract
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