Proceedings of the Optical Society of Korea Conference (한국광학회:학술대회논문집)
- 2003.02a
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- Pages.300-301
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- 2003
Multi-layer Structure Method for Manufacturing SiOB with Low Capacitance
낮은 정전용량을 가진 실리콘 광학벤치를 제작하기 위한 적층구조 방법
Abstract
As the demand for high frequency(bandwidth) optical module is increased, there is a need for fabricating silicon optical bench(SiOB) with low parasitic impedance. In this paper, we discuss multi-layer structure method for manufacturing SiOB with low capacitance. This structure method decreases the capacitance between the conductive patterns for about 94∼97% compared to the conventional structure without raising the resistivity of silicon, or increasing the thickness of the dielectric film.
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