Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2003.10a
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- Pages.119-119
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- 2003
PLASMA POLYMERIZED THIN FILMS GROWN BY PECVD METHOD AND COMPARISON OF THEIR ELECTROCHEMICAL PROPERTIES
- I.S. Bae (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- S.H. Cho (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Park, Z. T. (Department of Advanced Materials Engineering, Sungkyunkwan University) ;
- Kim, J.G. (Department of Advanced Materials Engineering, Sungkyunkwan University) ;
- B. Y. Hong (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- J.H. Boo (Center for Advanced Plasma Surface Technology, Sungkyunkwan University)
- Published : 2003.10.01
Abstract
Plasma polymerized organic thin films were deposited on Si(100) glass and Copper substrates at 25 ∼ 100
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